Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition

Milana C. Vasudev; Hilmar Koerner; Kristi M. Singh; Benjamin P. Partlow; David L. Kaplan; Ehud Gazit; Timothy J. Bunning; Rajesh R. Naik

doi:10.1021/bm401491k

Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition

Milana C. Vasudev, Hilmar Koerner, Kristi M. Singh, Benjamin P. Partlow, David L. Kaplan, Ehud Gazit, Timothy J. Bunning, Rajesh R. Naik

Biotechnology

Tel Aviv University

Research output: Contribution to journal › Article › peer-review

Abstract

In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.

Original language	English
Pages (from-to)	533-540
Number of pages	8
Journal	Biomacromolecules
Volume	15
Issue number	2
DOIs	https://doi.org/10.1021/bm401491k
State	Published - 10 Feb 2014

All Science Journal Classification (ASJC) codes

Bioengineering
Biomaterials
Polymers and Plastics
Materials Chemistry

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10.1021/bm401491k

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title = "Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition",

abstract = "In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.",

author = "Vasudev, \{Milana C.\} and Hilmar Koerner and Singh, \{Kristi M.\} and Partlow, \{Benjamin P.\} and Kaplan, \{David L.\} and Ehud Gazit and Bunning, \{Timothy J.\} and Naik, \{Rajesh R.\}",

year = "2014",

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doi = "10.1021/bm401491k",

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AU - Vasudev, Milana C.

AU - Koerner, Hilmar

AU - Singh, Kristi M.

AU - Partlow, Benjamin P.

AU - Kaplan, David L.

AU - Gazit, Ehud

AU - Bunning, Timothy J.

AU - Naik, Rajesh R.

PY - 2014/2/10

Y1 - 2014/2/10

N2 - In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.

AB - In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited D-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.

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U2 - 10.1021/bm401491k

DO - 10.1021/bm401491k

M3 - مقالة

SN - 1525-7797

VL - 15

SP - 533

EP - 540

JO - Biomacromolecules

JF - Biomacromolecules

IS - 2

ER -

Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition

Abstract

All Science Journal Classification (ASJC) codes

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