TY - GEN
T1 - Towards ultimate scaling limits of phase-change memory
AU - Xiong, F.
AU - Yalon, E.
AU - Behnam, A.
AU - Neumann, C. M.
AU - Grosse, K. L.
AU - Deshmukh, S.
AU - Pop, E.
N1 - Publisher Copyright: © 2016 IEEE.
PY - 2016/12
Y1 - 2016/12
N2 - Data storage based on a reversible material phase transition (e.g. amorphous to crystalline) has been studied for nearly five decades. Yet, it was only during the past five years that some phase-change memory technologies (e.g. GeSbTe) have been approaching the physical scaling limits of the smallest possible memory cell. Here we review recent results from our group and others, which have achieved sub-10 nm scale PCM with switching energy approaching single femtojoules per bit. Fundamental limits could be as low as single attojoules per cubic nanometer of the memory material, although approaching such limits in practice appears strongly limited by electrical and thermal parasitics, i.e. contacts and interfaces.
AB - Data storage based on a reversible material phase transition (e.g. amorphous to crystalline) has been studied for nearly five decades. Yet, it was only during the past five years that some phase-change memory technologies (e.g. GeSbTe) have been approaching the physical scaling limits of the smallest possible memory cell. Here we review recent results from our group and others, which have achieved sub-10 nm scale PCM with switching energy approaching single femtojoules per bit. Fundamental limits could be as low as single attojoules per cubic nanometer of the memory material, although approaching such limits in practice appears strongly limited by electrical and thermal parasitics, i.e. contacts and interfaces.
UR - https://www.scopus.com/pages/publications/85014473035
U2 - 10.1109/IEDM.2016.7838342
DO - 10.1109/IEDM.2016.7838342
M3 - Conference contribution
T3 - Technical Digest - International Electron Devices Meeting, IEDM
SP - 4.1.1-4.1.4
BT - 2016 IEEE International Electron Devices Meeting, IEDM 2016
T2 - 62nd IEEE International Electron Devices Meeting, IEDM 2016
Y2 - 3 December 2016 through 7 December 2016
ER -