The nanolithography toolbox

Krishna C. Balram; Daron A. Westly; Marcelo Davanço; Karen E. Grutter; Qing Li; Thomas Michels; Christopher H. Ray; Liya Yu; Richard J. Kasica; Christopher B. Wallin; Ian J. Gilbert; Brian A. Bryce; Gregory Simelgor; Juraj Topolancik; Nicolae Lobontiu; Yuxiang Liu; Pavel Neuzil; Vojtech Svatos; Kristen A. Dill; Neal A. Bertrand; Meredith G. Metzler; Gerald Lopez; David A. Czaplewski; Leonidas Ocola; Kartik A. Srinivasan; Samuel M. Stavis; Vladimir A. Aksyuk; J. Alexander Liddle; Slava Krylov; B. Robert Ilic

doi:https://doi.org/10.6028/jres.121.024

The nanolithography toolbox

Krishna C. Balram, Daron A. Westly, Marcelo Davanço, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Liya Yu, Richard J. Kasica, Christopher B. Wallin, Ian J. Gilbert, Brian A. Bryce, Gregory Simelgor, Juraj Topolancik, Nicolae Lobontiu, Yuxiang Liu, Pavel Neuzil, Vojtech Svatos, Kristen A. Dill, Neal A. BertrandMeredith G. Metzler, Gerald Lopez, David A. Czaplewski, Leonidas Ocola, Kartik A. Srinivasan, Samuel M. Stavis, Vladimir A. Aksyuk, J. Alexander Liddle, Slava Krylov, B. Robert Ilic

School of Mechanical Engineering

Tel Aviv University

Research output: Contribution to journal › Article › peer-review

Abstract

This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro-and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.

Original language	English
Pages (from-to)	464-475
Number of pages	12
Journal	Journal of Research of the National Institute of Standards and Technology
Volume	121
DOIs	https://doi.org/10.6028/jres.121.024
State	Published - 2016

Keywords

CAD
Lithography
Nanofabrication
Nanofluidic
Nanophotonic
Nanoplasmonic
Nanoscale curved features
Nanoscale design
Nanoscale devices

All Science Journal Classification (ASJC) codes

General Engineering

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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https://doi.org/10.6028/jres.121.024

Cite this

Balram, K. C., Westly, D. A., Davanço, M., Grutter, K. E., Li, Q., Michels, T., Ray, C. H., Yu, L., Kasica, R. J., Wallin, C. B., Gilbert, I. J., Bryce, B. A., Simelgor, G., Topolancik, J., Lobontiu, N., Liu, Y., Neuzil, P., Svatos, V., Dill, K. A., ... Robert Ilic, B. (2016). The nanolithography toolbox. Journal of Research of the National Institute of Standards and Technology, 121, 464-475. https://doi.org/10.6028/jres.121.024

@article{b6840ee8c2654122ad62448879227eb0,

title = "The nanolithography toolbox",

abstract = "This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro-and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.",

keywords = "CAD, Lithography, Nanofabrication, Nanofluidic, Nanophotonic, Nanoplasmonic, Nanoscale curved features, Nanoscale design, Nanoscale devices",

author = "Balram, {Krishna C.} and Westly, {Daron A.} and Marcelo Davan{\c c}o and Grutter, {Karen E.} and Qing Li and Thomas Michels and Ray, {Christopher H.} and Liya Yu and Kasica, {Richard J.} and Wallin, {Christopher B.} and Gilbert, {Ian J.} and Bryce, {Brian A.} and Gregory Simelgor and Juraj Topolancik and Nicolae Lobontiu and Yuxiang Liu and Pavel Neuzil and Vojtech Svatos and Dill, {Kristen A.} and Bertrand, {Neal A.} and Metzler, {Meredith G.} and Gerald Lopez and Czaplewski, {David A.} and Leonidas Ocola and Srinivasan, {Kartik A.} and Stavis, {Samuel M.} and Aksyuk, {Vladimir A.} and {Alexander Liddle}, J. and Slava Krylov and {Robert Ilic}, B.",

year = "2016",

doi = "https://doi.org/10.6028/jres.121.024",

language = "الإنجليزيّة",

volume = "121",

pages = "464--475",

journal = "Journal of Research of the National Institute of Standards and Technology",

issn = "1044-677X",

publisher = "National Institute of Standards and Technology",

}

Balram, KC, Westly, DA, Davanço, M, Grutter, KE, Li, Q, Michels, T, Ray, CH, Yu, L, Kasica, RJ, Wallin, CB, Gilbert, IJ, Bryce, BA, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, KA, Bertrand, NA, Metzler, MG, Lopez, G, Czaplewski, DA, Ocola, L, Srinivasan, KA, Stavis, SM, Aksyuk, VA, Alexander Liddle, J, Krylov, S & Robert Ilic, B 2016, 'The nanolithography toolbox', Journal of Research of the National Institute of Standards and Technology, vol. 121, pp. 464-475. https://doi.org/10.6028/jres.121.024

TY - JOUR

T1 - The nanolithography toolbox

AU - Balram, Krishna C.

AU - Westly, Daron A.

AU - Davanço, Marcelo

AU - Grutter, Karen E.

AU - Li, Qing

AU - Michels, Thomas

AU - Ray, Christopher H.

AU - Yu, Liya

AU - Kasica, Richard J.

AU - Wallin, Christopher B.

AU - Gilbert, Ian J.

AU - Bryce, Brian A.

AU - Simelgor, Gregory

AU - Topolancik, Juraj

AU - Lobontiu, Nicolae

AU - Liu, Yuxiang

AU - Neuzil, Pavel

AU - Svatos, Vojtech

AU - Dill, Kristen A.

AU - Bertrand, Neal A.

AU - Metzler, Meredith G.

AU - Lopez, Gerald

AU - Czaplewski, David A.

AU - Ocola, Leonidas

AU - Srinivasan, Kartik A.

AU - Stavis, Samuel M.

AU - Aksyuk, Vladimir A.

AU - Alexander Liddle, J.

AU - Krylov, Slava

AU - Robert Ilic, B.

PY - 2016

Y1 - 2016

N2 - This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro-and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.

AB - This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro-and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.

KW - CAD

KW - Lithography

KW - Nanofabrication

KW - Nanofluidic

KW - Nanophotonic

KW - Nanoplasmonic

KW - Nanoscale curved features

KW - Nanoscale design

KW - Nanoscale devices

UR - http://www.scopus.com/inward/record.url?scp=84994388394&partnerID=8YFLogxK

U2 - https://doi.org/10.6028/jres.121.024

DO - https://doi.org/10.6028/jres.121.024

M3 - مقالة

SN - 1044-677X

VL - 121

SP - 464

EP - 475

JO - Journal of Research of the National Institute of Standards and Technology

JF - Journal of Research of the National Institute of Standards and Technology

ER -

The nanolithography toolbox

Abstract

Keywords

All Science Journal Classification (ASJC) codes

UN SDGs

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