Super resolved computational photo-lithography recording based upon multiple exposures and self-assembled nano-structures

Z. Zalevsky; Y. Danan; R. Menon

Super resolved computational photo-lithography recording based upon multiple exposures and self-assembled nano-structures

Z. Zalevsky, Y. Danan, R. Menon

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	American English
Title of host publication	Prof. of Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online) (Optical Society of America, 2017), paper CW4B.2
State	Published - 2017

Cite this

@inproceedings{fbdf6b966bd94e11aba29c846d071add,

title = "Super resolved computational photo-lithography recording based upon multiple exposures and self-assembled nano-structures",

author = "Z. Zalevsky and Y. Danan and R. Menon",

note = "Place of conference:USA",

year = "2017",

language = "American English",

booktitle = "Prof. of Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online) (Optical Society of America, 2017), paper CW4B.2",

}

Super resolved computational photo-lithography recording based upon multiple exposures and self-assembled nano-structures. / Zalevsky, Z.; Danan, Y.; Menon, R.
Prof. of Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online) (Optical Society of America, 2017), paper CW4B.2. 2017.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Super resolved computational photo-lithography recording based upon multiple exposures and self-assembled nano-structures

AU - Zalevsky, Z.

AU - Danan, Y.

AU - Menon, R.

N1 - Place of conference:USA

PY - 2017

Y1 - 2017

M3 - Conference contribution

BT - Prof. of Imaging and Applied Optics 2017 (3D, AIO, COSI, IS, MATH, pcAOP), OSA Technical Digest (online) (Optical Society of America, 2017), paper CW4B.2

ER -