Sub-rayleigh lithography using high flux loss-resistant rntangled states of light

Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.