Sub-Rayleigh Lithography Using High Flux Loss-Resistant Entangled States of Light

Shamir Rosen, Itai Afek, Yonatan Israel, Oron Ambar, Yaron Silberberg

Research output: Contribution to journalArticlepeer-review

Abstract

Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.
Original languageEnglish
Article number103602
Number of pages5
JournalPhysical review letters
Volume109
Issue number10
DOIs
StatePublished - 6 Sep 2012

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy

Fingerprint

Dive into the research topics of 'Sub-Rayleigh Lithography Using High Flux Loss-Resistant Entangled States of Light'. Together they form a unique fingerprint.

Cite this