TY - JOUR
T1 - Sub-Rayleigh Lithography Using High Flux Loss-Resistant Entangled States of Light
AU - Rosen, Shamir
AU - Afek, Itai
AU - Israel, Yonatan
AU - Ambar, Oron
AU - Silberberg, Yaron
N1 - ERC grant QUAMI; Minerva Foundation; Crown Photonics CenterFinancial support of this research by the ERC grant QUAMI, the Minerva Foundation, and the Crown Photonics Center is gratefully acknowledged. Thanks also go to Y. Lahini and E. Poem for helpful discussions.
PY - 2012/9/6
Y1 - 2012/9/6
N2 - Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.
AB - Quantum lithography achieves phase superresolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable with reduced use of quantum resources and, consequently, enhanced resistance to loss. The scheme is an implementation of interferometric lithography using a mixture of a spontaneous parametric down-converted entangled state with intense classical coherent light. We measure coincidences of up to four photons mimicking multiphoton absorption. The results show a narrowing of the interference fringes of up to 30% with respect to the best analogous classical scheme using only 10% of the nonclassical light required for creating NOON states.
UR - http://www.scopus.com/inward/record.url?scp=84866065827&partnerID=8YFLogxK
U2 - https://doi.org/10.1103/PhysRevLett.109.103602
DO - https://doi.org/10.1103/PhysRevLett.109.103602
M3 - مقالة
SN - 0031-9007
VL - 109
JO - Physical review letters
JF - Physical review letters
IS - 10
M1 - 103602
ER -