Abstract
Nanopatterning of features at current technology nodes requires expensive deep UV lithography or low throughput electron beam lithography. Here we demonstrate a modification of carbon nanotube (CNT) enabled self-aligned nanotrench ablation (SANTA) to achieve sub-15 nm dimensions for metal patterning. The technique utilizes nanoscale thermal transport within a typical polymer, in this case, poly-methyl methacrylate (PMMA) at cryogenic ambient temperatures (-120°C) for definition of highly scaled features. The technique shows promise for nanofabrication below sub-10 nm dimensions.
| Original language | English |
|---|---|
| Title of host publication | 2017 IEEE 17th International Conference on Nanotechnology, NANO 2017 |
| Pages | 489-490 |
| Number of pages | 2 |
| ISBN (Electronic) | 9781509030286 |
| DOIs | |
| State | Published - 21 Nov 2017 |
| Externally published | Yes |
| Event | 17th IEEE International Conference on Nanotechnology, NANO 2017 - Pittsburgh, United States Duration: 25 Jul 2017 → 28 Jul 2017 |
Publication series
| Name | 2017 IEEE 17th International Conference on Nanotechnology, NANO 2017 |
|---|
Conference
| Conference | 17th IEEE International Conference on Nanotechnology, NANO 2017 |
|---|---|
| Country/Territory | United States |
| City | Pittsburgh |
| Period | 25/07/17 → 28/07/17 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
-
SDG 9 Industry, Innovation, and Infrastructure
Keywords
- carbon nanotubes
- finite element
- nanolithography
- nanoscale thermal transport
- nanowire
- self-aligned fabrication
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver