Sub-15 nm nanowires enabled by cryo pulsed self-aligned nanotrench ablation on carbon nanotubes

Sanchit Deshmukh, Feifei Lian, Eilam Yalon, Gregory Pitner, H. S.Philip Wong, Eric Pop

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Nanopatterning of features at current technology nodes requires expensive deep UV lithography or low throughput electron beam lithography. Here we demonstrate a modification of carbon nanotube (CNT) enabled self-aligned nanotrench ablation (SANTA) to achieve sub-15 nm dimensions for metal patterning. The technique utilizes nanoscale thermal transport within a typical polymer, in this case, poly-methyl methacrylate (PMMA) at cryogenic ambient temperatures (-120°C) for definition of highly scaled features. The technique shows promise for nanofabrication below sub-10 nm dimensions.

Original languageEnglish
Title of host publication2017 IEEE 17th International Conference on Nanotechnology, NANO 2017
Pages489-490
Number of pages2
ISBN (Electronic)9781509030286
DOIs
StatePublished - 21 Nov 2017
Externally publishedYes
Event17th IEEE International Conference on Nanotechnology, NANO 2017 - Pittsburgh, United States
Duration: 25 Jul 201728 Jul 2017

Publication series

Name2017 IEEE 17th International Conference on Nanotechnology, NANO 2017

Conference

Conference17th IEEE International Conference on Nanotechnology, NANO 2017
Country/TerritoryUnited States
CityPittsburgh
Period25/07/1728/07/17

Keywords

  • carbon nanotubes
  • finite element
  • nanolithography
  • nanoscale thermal transport
  • nanowire
  • self-aligned fabrication

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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