Strain in epitaxial MnSi films on Si(111) in the thick film limit studied by polarization-dependent extended x-ray absorption fine structure

A. I. Figueroa, S. L. Zhang, A. A. Baker, R. Chalasani, A. Kohn, S. C. Speller, D. Gianolio, C. Pfleiderer, G. Van Der Laan, T. Hesjedal

Tel Aviv University

Research output: Contribution to journal › Article › peer-review

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