Silicon oxide dissolution in fluorohydrogenates ionic liquid

B. Shvartsev; D. Gelman; D. Starosvetsky; Y. Ein-Eli

doi:https://doi.org/10.1149/2.0971605jes

Silicon oxide dissolution in fluorohydrogenates ionic liquid

B. Shvartsev, D. Gelman, D. Starosvetsky, Y. Ein-Eli

Technion - Israel Institute of Technology

Research output: Contribution to journal › Article › peer-review

Abstract

The first evidence of SiO₂ dissolution process in oligo-fluoro-hydrogenate [EMIm(HF)2.3F] room temperature ionic liquid (RTIL) is reported here. Based on the electrochemical measurements, the etch rate of SiO₂ in this specific ionic liquid media was found to be lower by an order of magnitude than the measured rate in similar solution volumes of aqueous HF. NMR and FTIR spectroscopies enabled to determine the dissolution mechanism of SiO₂ in the oligo-fluoro-hydrogenate ionic liquid. Confirmation of the formation of both water and SiF₆ ²⁻ as the reaction products was established. Moreover, the presence of water influences the anionic ratio in the ionic liquid.

Original language	English
Pages (from-to)	E135-E141
Journal	Journal of the Electrochemical Society
Volume	163
Issue number	5
DOIs	https://doi.org/10.1149/2.0971605jes
State	Published - 2016

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Materials Chemistry
Surfaces, Coatings and Films
Electrochemistry
Renewable Energy, Sustainability and the Environment

Access to Document

https://doi.org/10.1149/2.0971605jes

Cite this

@article{dbdd75fb925142759988f7bd79c493ce,

title = "Silicon oxide dissolution in fluorohydrogenates ionic liquid",

abstract = "The first evidence of SiO2 dissolution process in oligo-fluoro-hydrogenate [EMIm(HF)2.3F] room temperature ionic liquid (RTIL) is reported here. Based on the electrochemical measurements, the etch rate of SiO2 in this specific ionic liquid media was found to be lower by an order of magnitude than the measured rate in similar solution volumes of aqueous HF. NMR and FTIR spectroscopies enabled to determine the dissolution mechanism of SiO2 in the oligo-fluoro-hydrogenate ionic liquid. Confirmation of the formation of both water and SiF6 2− as the reaction products was established. Moreover, the presence of water influences the anionic ratio in the ionic liquid.",

author = "B. Shvartsev and D. Gelman and D. Starosvetsky and Y. Ein-Eli",

note = "Publisher Copyright: {\textcopyright} 2016 The Electrochemical Society.",

year = "2016",

doi = "https://doi.org/10.1149/2.0971605jes",

language = "الإنجليزيّة",

volume = "163",

pages = "E135--E141",

journal = "Journal of the Electrochemical Society",

issn = "0013-4651",

publisher = "Electrochemical Society, Inc.",

number = "5",

}

TY - JOUR

T1 - Silicon oxide dissolution in fluorohydrogenates ionic liquid

AU - Shvartsev, B.

AU - Gelman, D.

AU - Starosvetsky, D.

AU - Ein-Eli, Y.

PY - 2016

Y1 - 2016

N2 - The first evidence of SiO2 dissolution process in oligo-fluoro-hydrogenate [EMIm(HF)2.3F] room temperature ionic liquid (RTIL) is reported here. Based on the electrochemical measurements, the etch rate of SiO2 in this specific ionic liquid media was found to be lower by an order of magnitude than the measured rate in similar solution volumes of aqueous HF. NMR and FTIR spectroscopies enabled to determine the dissolution mechanism of SiO2 in the oligo-fluoro-hydrogenate ionic liquid. Confirmation of the formation of both water and SiF6 2− as the reaction products was established. Moreover, the presence of water influences the anionic ratio in the ionic liquid.

AB - The first evidence of SiO2 dissolution process in oligo-fluoro-hydrogenate [EMIm(HF)2.3F] room temperature ionic liquid (RTIL) is reported here. Based on the electrochemical measurements, the etch rate of SiO2 in this specific ionic liquid media was found to be lower by an order of magnitude than the measured rate in similar solution volumes of aqueous HF. NMR and FTIR spectroscopies enabled to determine the dissolution mechanism of SiO2 in the oligo-fluoro-hydrogenate ionic liquid. Confirmation of the formation of both water and SiF6 2− as the reaction products was established. Moreover, the presence of water influences the anionic ratio in the ionic liquid.

UR - http://www.scopus.com/inward/record.url?scp=85028913468&partnerID=8YFLogxK

U2 - https://doi.org/10.1149/2.0971605jes

DO - https://doi.org/10.1149/2.0971605jes

M3 - مقالة

SN - 0013-4651

VL - 163

SP - E135-E141

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

IS - 5

ER -

Silicon oxide dissolution in fluorohydrogenates ionic liquid

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this