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Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition

  • Igor Krylov
  • , Yuanshen Qi
  • , Valentina Korchnoy
  • , Kamira Weinfeld
  • , Moshe Eizenberg
  • , Eilam Yalon

Technion - Israel Institute of Technology

Research output: Contribution to journal › Article › peer-review

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Material Science