On the operation of a micropattern gaseous UV-photomultiplier in liquid-Xenon

S. Duval, Amos Breskin, Ran Budnik, W. T. Chen, H. Carduner, Marco Cortesi, J. P. Cussonneau, J. Donnard, J. Lamblin, Ray, P. Le Ray, E. Morteau, T. Oger, J. S. Stutzmann, D. Thers

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Operation results are presented of a UV-sensitive gaseous photomultiplier (GPM) coupled through a MgF(2) window to a liquid-xenon scintillator. It consisted of a reflective CsI photocathode deposited on top of a THick Gaseous Electron Multiplier (THGEM); further multiplication stages were either a second THGEM or a Parallel Ionization Multiplier (PIM) followed by a MI-CROMEsh GAseous Structure (MICROMEGAS). The GPM operated in gas-flow mode with non-condensable gas mixtures. Gains of 10(4) were measured with a CsI-coated double-THGEM detector in Ne/CH(4)(95:5), Ne/CF(4) (95:5) and Ne/CH(4)/CF(4)(90:5:5), with soft X-rays at 173 K. Scintillation signals induced by alpha particles in liquid xenon were measured here for the first time with a double-THGEM GPM in He/CH(4)(92.5:7.5) and a triple-structure THGEM/PIM/MICROMEGAS GPM in Ne/CH(4)(90:10) with a fast-current preamplifier.
Original languageEnglish
Article numberP04007
Number of pages13
JournalJournal of Instrumentation
StatePublished - Apr 2011


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