Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

Tuyen Nguyen; Adib Tavakoli; Sebastien Triqueneaux; Rahul Swami; Aki Ruhtinas; Jeremy Gradel; Pablo Garcia-Campos; Klaus Hasselbach; Aviad Frydman; Benjamin Piot; Mathieu Gibert; Eddy Collin; Olivier Bourgeois

doi:10.1007/s10909-019-02222-6

Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

Tuyen Nguyen, Adib Tavakoli, Sebastien Triqueneaux, Rahul Swami, Aki Ruhtinas, Jeremy Gradel, Pablo Garcia-Campos, Klaus Hasselbach, Aviad Frydman, Benjamin Piot, Mathieu Gibert, Eddy Collin, Olivier Bourgeois

Department of Physics - at Bar-Ilan University

Bar-Ilan University

Research output: Contribution to journal › Article › peer-review

Abstract

We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.

Original language	English
Pages (from-to)	348-356
Number of pages	9
Journal	Journal of Low Temperature Physics
Volume	197
Issue number	5-6
DOIs	https://doi.org/10.1007/s10909-019-02222-6
State	Published - 1 Dec 2019

Keywords

Nanoscale
Niobium nitride
Resistive thermometry
Thin film

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics
General Materials Science
Condensed Matter Physics

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10.1007/s10909-019-02222-6

Cite this

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title = "Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry",

abstract = "We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.",

keywords = "Nanoscale, Niobium nitride, Resistive thermometry, Thin film",

author = "Tuyen Nguyen and Adib Tavakoli and Sebastien Triqueneaux and Rahul Swami and Aki Ruhtinas and Jeremy Gradel and Pablo Garcia-Campos and Klaus Hasselbach and Aviad Frydman and Benjamin Piot and Mathieu Gibert and Eddy Collin and Olivier Bourgeois",

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doi = "10.1007/s10909-019-02222-6",

language = "الإنجليزيّة",

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T1 - Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

AU - Nguyen, Tuyen

AU - Tavakoli, Adib

AU - Triqueneaux, Sebastien

AU - Swami, Rahul

AU - Ruhtinas, Aki

AU - Gradel, Jeremy

AU - Garcia-Campos, Pablo

AU - Hasselbach, Klaus

AU - Frydman, Aviad

AU - Piot, Benjamin

AU - Gibert, Mathieu

AU - Collin, Eddy

AU - Bourgeois, Olivier

PY - 2019/12/1

Y1 - 2019/12/1

N2 - We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.

AB - We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.

KW - Nanoscale

KW - Niobium nitride

KW - Resistive thermometry

KW - Thin film

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DO - 10.1007/s10909-019-02222-6

M3 - مقالة

SN - 0022-2291

VL - 197

SP - 348

EP - 356

JO - Journal of Low Temperature Physics

JF - Journal of Low Temperature Physics

IS - 5-6

ER -

Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

Abstract

Keywords

All Science Journal Classification (ASJC) codes

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