Nanolithography toolbox: Device design at the nanoscale

K. C. Balram; D. A. Westly; M. Davanco; K. E. Grutter; Q. Li; T. Michels; C. H. Ray; L. Yu; R. J. Kasica; C. B. Wallin; I. J. Gilbert; Brian A. Bryce; G. Simelgor; J. Topolancik; N. Lobontiu; Y. Liu; P. Neuzil; V. Svatos; K. A. Dill; N. A. Bertrand; M. Metzler; G. Lopez; D. A. Czaplewski; L. Ocola; K. A. Srinivasan; S. M. Stavis; V. A. Aksyuk; J. A. Liddle; S. Krylov; B. R. Ilic

doi:https://doi.org/10.1364/CLEO_AT.2017.ATh3B.6

Nanolithography toolbox: Device design at the nanoscale

K. C. Balram, D. A. Westly, M. Davanco, K. E. Grutter, Q. Li, T. Michels, C. H. Ray, L. Yu, R. J. Kasica, C. B. Wallin, I. J. Gilbert, Brian A. Bryce, G. Simelgor, J. Topolancik, N. Lobontiu, Y. Liu, P. Neuzil, V. Svatos, K. A. Dill, N. A. BertrandM. Metzler, G. Lopez, D. A. Czaplewski, L. Ocola, K. A. Srinivasan, S. M. Stavis, V. A. Aksyuk, J. A. Liddle, S. Krylov, B. R. Ilic

School of Mechanical Engineering

Tel Aviv University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.

Original language	English
Title of host publication	CLEO
Subtitle of host publication	Applications and Technology, CLEO_AT 2017
Publisher	Optica Publishing Group (formerly OSA)
Pages	1-2
Number of pages	2
ISBN (Electronic)	9781943580279
ISBN (Print)	9781943580279
DOIs	https://doi.org/10.1364/CLEO_AT.2017.ATh3B.6
State	Published - 25 Oct 2017
Event	CLEO: Applications and Technology, CLEO_AT 2017 - San Jose, United States Duration: 14 May 2017 → 19 May 2017

Publication series

Name	Optics InfoBase Conference Papers
Volume	Part F43-CLEO_AT 2017

Conference

Conference	CLEO: Applications and Technology, CLEO_AT 2017
Country/Territory	United States
City	San Jose
Period	14/05/17 → 19/05/17

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Mechanics of Materials
Atomic and Molecular Physics, and Optics
Instrumentation

Access to Document

https://doi.org/10.1364/CLEO_AT.2017.ATh3B.6

Cite this

Balram, K. C., Westly, D. A., Davanco, M., Grutter, K. E., Li, Q., Michels, T., Ray, C. H., Yu, L., Kasica, R. J., Wallin, C. B., Gilbert, I. J., Bryce, B. A., Simelgor, G., Topolancik, J., Lobontiu, N., Liu, Y., Neuzil, P., Svatos, V., Dill, K. A., ... Ilic, B. R. (2017). Nanolithography toolbox: Device design at the nanoscale. In CLEO: Applications and Technology, CLEO_AT 2017 (pp. 1-2). (Optics InfoBase Conference Papers; Vol. Part F43-CLEO_AT 2017). Optica Publishing Group (formerly OSA). https://doi.org/10.1364/CLEO_AT.2017.ATh3B.6

@inproceedings{d866d6d15ecb4d45a307a85221f9d072,

title = "Nanolithography toolbox: Device design at the nanoscale",

abstract = "We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.",

author = "Balram, {K. C.} and Westly, {D. A.} and M. Davanco and Grutter, {K. E.} and Q. Li and T. Michels and Ray, {C. H.} and L. Yu and Kasica, {R. J.} and Wallin, {C. B.} and Gilbert, {I. J.} and Bryce, {Brian A.} and G. Simelgor and J. Topolancik and N. Lobontiu and Y. Liu and P. Neuzil and V. Svatos and Dill, {K. A.} and Bertrand, {N. A.} and M. Metzler and G. Lopez and Czaplewski, {D. A.} and L. Ocola and Srinivasan, {K. A.} and Stavis, {S. M.} and Aksyuk, {V. A.} and Liddle, {J. A.} and S. Krylov and Ilic, {B. R.}",

note = "Publisher Copyright: {\textcopyright} 2017 OSA.; CLEO: Applications and Technology, CLEO_AT 2017 ; Conference date: 14-05-2017 Through 19-05-2017",

year = "2017",

month = oct,

day = "25",

doi = "https://doi.org/10.1364/CLEO_AT.2017.ATh3B.6",

language = "الإنجليزيّة",

isbn = "9781943580279",

series = "Optics InfoBase Conference Papers",

publisher = "Optica Publishing Group (formerly OSA)",

pages = "1--2",

booktitle = "CLEO",

}

Balram, KC, Westly, DA, Davanco, M, Grutter, KE, Li, Q, Michels, T, Ray, CH, Yu, L, Kasica, RJ, Wallin, CB, Gilbert, IJ, Bryce, BA, Simelgor, G, Topolancik, J, Lobontiu, N, Liu, Y, Neuzil, P, Svatos, V, Dill, KA, Bertrand, NA, Metzler, M, Lopez, G, Czaplewski, DA, Ocola, L, Srinivasan, KA, Stavis, SM, Aksyuk, VA, Liddle, JA, Krylov, S & Ilic, BR 2017, Nanolithography toolbox: Device design at the nanoscale. in CLEO: Applications and Technology, CLEO_AT 2017. Optics InfoBase Conference Papers, vol. Part F43-CLEO_AT 2017, Optica Publishing Group (formerly OSA), pp. 1-2, CLEO: Applications and Technology, CLEO_AT 2017, San Jose, United States, 14/05/17. https://doi.org/10.1364/CLEO_AT.2017.ATh3B.6

Nanolithography toolbox: Device design at the nanoscale. / Balram, K. C.; Westly, D. A.; Davanco, M. et al.
CLEO: Applications and Technology, CLEO_AT 2017. Optica Publishing Group (formerly OSA), 2017. p. 1-2 (Optics InfoBase Conference Papers; Vol. Part F43-CLEO_AT 2017).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Nanolithography toolbox

T2 - CLEO: Applications and Technology, CLEO_AT 2017

AU - Balram, K. C.

AU - Westly, D. A.

AU - Davanco, M.

AU - Grutter, K. E.

AU - Li, Q.

AU - Michels, T.

AU - Ray, C. H.

AU - Yu, L.

AU - Kasica, R. J.

AU - Wallin, C. B.

AU - Gilbert, I. J.

AU - Bryce, Brian A.

AU - Simelgor, G.

AU - Topolancik, J.

AU - Lobontiu, N.

AU - Liu, Y.

AU - Neuzil, P.

AU - Svatos, V.

AU - Dill, K. A.

AU - Bertrand, N. A.

AU - Metzler, M.

AU - Lopez, G.

AU - Czaplewski, D. A.

AU - Ocola, L.

AU - Srinivasan, K. A.

AU - Stavis, S. M.

AU - Aksyuk, V. A.

AU - Liddle, J. A.

AU - Krylov, S.

AU - Ilic, B. R.

PY - 2017/10/25

Y1 - 2017/10/25

N2 - We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.

AB - We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.

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U2 - https://doi.org/10.1364/CLEO_AT.2017.ATh3B.6

DO - https://doi.org/10.1364/CLEO_AT.2017.ATh3B.6

M3 - منشور من مؤتمر

SN - 9781943580279

T3 - Optics InfoBase Conference Papers

SP - 1

EP - 2

BT - CLEO

PB - Optica Publishing Group (formerly OSA)

Y2 - 14 May 2017 through 19 May 2017

ER -

Nanolithography toolbox: Device design at the nanoscale

Abstract

Publication series

Conference

All Science Journal Classification (ASJC) codes

Access to Document

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