Multi-channel wafer defect detection using diffusion maps

Gal Mishne, Israel Cohen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Detection of defects on patterned semiconductor wafers is a critical step in wafer production. Many inspection methods and apparatus have been developed for this purpose. We recently presented an anomaly detection approach based on geometric manifold learning techniques. This approach is data-driven, with the separation of the anomaly from the background arising from the intrinsic geometry of the image, revealed through the use of diffusion maps. In this paper, we extend our algorithm to 3D data in multichannel wafer defect detection. We test our algorithm on a set of semiconductor wafers and demonstrate that our multiscale multi-channel algorithm has superior performance when compared to single-scale and single-channel approaches.

Original languageEnglish
Title of host publication2014 IEEE 28th Convention of Electrical and Electronics Engineers in Israel, IEEEI 2014
ISBN (Electronic)9781479959877
DOIs
StatePublished - 2014
Event2014 28th IEEE Convention of Electrical and Electronics Engineers in Israel, IEEEI 2014 - Eilat, Israel
Duration: 3 Dec 20145 Dec 2014

Publication series

Name2014 IEEE 28th Convention of Electrical and Electronics Engineers in Israel, IEEEI 2014

Conference

Conference2014 28th IEEE Convention of Electrical and Electronics Engineers in Israel, IEEEI 2014
Country/TerritoryIsrael
CityEilat
Period3/12/145/12/14

Keywords

  • Anomaly detection
  • Diffusion maps
  • Dimensionality reduction
  • Multiscale representation
  • Wafer defect detection

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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