MoS 2 cleaning by acetone and UV-ozone: Geological and synthetic material

Keren M. Freedy; Maria Gabriela Sales; Peter M. Litwin; Sergiy Krylyuk; Pranab Mohapatra; Ariel Ismach; Albert V. Davydov; Stephen J. McDonnell

doi:10.1016/j.apsusc.2019.01.222

MoS ₂ cleaning by acetone and UV-ozone: Geological and synthetic material

Keren M. Freedy, Maria Gabriela Sales, Peter M. Litwin, Sergiy Krylyuk, Pranab Mohapatra, Ariel Ismach, Albert V. Davydov, Stephen J. McDonnell

Department of Materials Science and Engineering

Tel Aviv University

Research output: Contribution to journal › Article › peer-review

Abstract

The effects of poly(methyl methacrylate) PMMA removal procedures on the surface chemistry of both geological and synthetic MoS ₂ are investigated. X-ray photoelectron spectroscopy (XPS) is employed following acetone dissolution, thermal annealing, and ultraviolet-ozone (UV-O ₃ ) treatment of PMMA-coated MoS ₂ samples. Specifically, we focus on the efficacy of polymer residue removal procedures and oxidation resistance of the different samples. Acetone dissolution followed by ultra-high vacuum (UHV) annealing was highly effective in removing carbon residues from one type of geological sample however not for a synthetic sample produced by sulfurization. Similarly, different types of samples require varying lengths of UV-O ₃ exposure time for proper removal of residues, and some exhibit oxidation as a result. UV-O ₃ exposure followed by a UHV anneal resulted in successful removal of carbon residues from MoS ₂ produced by sulfurization while a substantial carbon signal remained on a chemical vapor deposited MoS ₂ sample subjected to the same process. Differences in the effects of removal procedures are attributed to differences in surface morphology and material quality. For device fabrication applications, this work highlights the importance of developing PMMA removal processes specific to the MoS ₂ used with full consideration for the processing required to obtain the MoS ₂ .

Original language	English
Pages (from-to)	183-188
Number of pages	6
Journal	Applied Surface Science
Volume	478
DOIs	https://doi.org/10.1016/j.apsusc.2019.01.222
State	Published - 1 Jun 2019

Keywords

Ozone
Photoresist residues
Surface treatments
X-ray photoelectron spectroscopy

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/j.apsusc.2019.01.222

Cite this

@article{636999ee12794858bdc3f43245c82d11,

title = "MoS 2 cleaning by acetone and UV-ozone: Geological and synthetic material",

abstract = " The effects of poly(methyl methacrylate) PMMA removal procedures on the surface chemistry of both geological and synthetic MoS 2 are investigated. X-ray photoelectron spectroscopy (XPS) is employed following acetone dissolution, thermal annealing, and ultraviolet-ozone (UV-O 3 ) treatment of PMMA-coated MoS 2 samples. Specifically, we focus on the efficacy of polymer residue removal procedures and oxidation resistance of the different samples. Acetone dissolution followed by ultra-high vacuum (UHV) annealing was highly effective in removing carbon residues from one type of geological sample however not for a synthetic sample produced by sulfurization. Similarly, different types of samples require varying lengths of UV-O 3 exposure time for proper removal of residues, and some exhibit oxidation as a result. UV-O 3 exposure followed by a UHV anneal resulted in successful removal of carbon residues from MoS 2 produced by sulfurization while a substantial carbon signal remained on a chemical vapor deposited MoS 2 sample subjected to the same process. Differences in the effects of removal procedures are attributed to differences in surface morphology and material quality. For device fabrication applications, this work highlights the importance of developing PMMA removal processes specific to the MoS 2 used with full consideration for the processing required to obtain the MoS 2 .",

keywords = "Ozone, Photoresist residues, Surface treatments, X-ray photoelectron spectroscopy",

author = "Freedy, {Keren M.} and Sales, {Maria Gabriela} and Litwin, {Peter M.} and Sergiy Krylyuk and Pranab Mohapatra and Ariel Ismach and Davydov, {Albert V.} and McDonnell, {Stephen J.}",

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year = "2019",

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doi = "10.1016/j.apsusc.2019.01.222",

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AU - Freedy, Keren M.

AU - Sales, Maria Gabriela

AU - Litwin, Peter M.

AU - Krylyuk, Sergiy

AU - Mohapatra, Pranab

AU - Ismach, Ariel

AU - Davydov, Albert V.

AU - McDonnell, Stephen J.

PY - 2019/6/1

Y1 - 2019/6/1

N2 - The effects of poly(methyl methacrylate) PMMA removal procedures on the surface chemistry of both geological and synthetic MoS 2 are investigated. X-ray photoelectron spectroscopy (XPS) is employed following acetone dissolution, thermal annealing, and ultraviolet-ozone (UV-O 3 ) treatment of PMMA-coated MoS 2 samples. Specifically, we focus on the efficacy of polymer residue removal procedures and oxidation resistance of the different samples. Acetone dissolution followed by ultra-high vacuum (UHV) annealing was highly effective in removing carbon residues from one type of geological sample however not for a synthetic sample produced by sulfurization. Similarly, different types of samples require varying lengths of UV-O 3 exposure time for proper removal of residues, and some exhibit oxidation as a result. UV-O 3 exposure followed by a UHV anneal resulted in successful removal of carbon residues from MoS 2 produced by sulfurization while a substantial carbon signal remained on a chemical vapor deposited MoS 2 sample subjected to the same process. Differences in the effects of removal procedures are attributed to differences in surface morphology and material quality. For device fabrication applications, this work highlights the importance of developing PMMA removal processes specific to the MoS 2 used with full consideration for the processing required to obtain the MoS 2 .

AB - The effects of poly(methyl methacrylate) PMMA removal procedures on the surface chemistry of both geological and synthetic MoS 2 are investigated. X-ray photoelectron spectroscopy (XPS) is employed following acetone dissolution, thermal annealing, and ultraviolet-ozone (UV-O 3 ) treatment of PMMA-coated MoS 2 samples. Specifically, we focus on the efficacy of polymer residue removal procedures and oxidation resistance of the different samples. Acetone dissolution followed by ultra-high vacuum (UHV) annealing was highly effective in removing carbon residues from one type of geological sample however not for a synthetic sample produced by sulfurization. Similarly, different types of samples require varying lengths of UV-O 3 exposure time for proper removal of residues, and some exhibit oxidation as a result. UV-O 3 exposure followed by a UHV anneal resulted in successful removal of carbon residues from MoS 2 produced by sulfurization while a substantial carbon signal remained on a chemical vapor deposited MoS 2 sample subjected to the same process. Differences in the effects of removal procedures are attributed to differences in surface morphology and material quality. For device fabrication applications, this work highlights the importance of developing PMMA removal processes specific to the MoS 2 used with full consideration for the processing required to obtain the MoS 2 .

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