METHOD FOR PRODUCTION OF LIXSIYOZ COATINGS USING A SINGLE SOURCE FOR LI AND SI AND RESULTANT COATED PRODUCTS

Malakhi Noked; Yitzhak Apeloig; Yosi Kratish; Dmitry Bravo-Zhivotovskii; Rosy Sharma

METHOD FOR PRODUCTION OF LIXSIYOZ COATINGS USING A SINGLE SOURCE FOR LI AND SI AND RESULTANT COATED PRODUCTS

Malakhi Noked (Inventor), Yitzhak Apeloig (Inventor), Yosi Kratish (Inventor), Dmitry Bravo-Zhivotovskii (Inventor), Rosy Sharma (Inventor)

Technion - Israel Institute of Technology

Research output: Patent

Abstract

Some exemplary embodiments of the invention relate to performing atomic layer deposition (ALD) or molecular layer deposition (MLD) of a volatile organo silyl lithium compound and ozone on a substrate. According to various exemplary embodiments of the invention the volatile organo silyl lithium compound includes SiLi2tBuMe and/or tBuMe2SiLi and/or tBuMe2SiNa and/or SiLi3Et and/or Alk3GeLi and/or [(Alk3Si)4AI]Li and/or (NMe2)(tBu)2SiLi and/or tBuMe2SiLi-TMEDA and/or SiLi + TMA2tBuMe. Resultant coated products and their uses are also disclosed.

Original language	American English
Patent number	WO2021156867
IPC	H01M 10/ 0525 A I
Priority date	6/02/20
State	Published - 12 Aug 2021

Cite this

@misc{abc0794b26464b1a8cfe442c9fac6ece,

title = "METHOD FOR PRODUCTION OF LIXSIYOZ COATINGS USING A SINGLE SOURCE FOR LI AND SI AND RESULTANT COATED PRODUCTS",

abstract = "Some exemplary embodiments of the invention relate to performing atomic layer deposition (ALD) or molecular layer deposition (MLD) of a volatile organo silyl lithium compound and ozone on a substrate. According to various exemplary embodiments of the invention the volatile organo silyl lithium compound includes SiLi2tBuMe and/or tBuMe2SiLi and/or tBuMe2SiNa and/or SiLi3Et and/or Alk3GeLi and/or [(Alk3Si)4AI]Li and/or (NMe2)(tBu)2SiLi and/or tBuMe2SiLi-TMEDA and/or SiLi + TMA2tBuMe. Resultant coated products and their uses are also disclosed.",

author = "Malakhi Noked and Yitzhak Apeloig and Yosi Kratish and Dmitry Bravo-Zhivotovskii and Rosy Sharma",

year = "2021",

month = aug,

day = "12",

language = "American English",

type = "Patent",

note = "WO2021156867; H01M 10/ 0525 A I",

}

TY - PAT

T1 - METHOD FOR PRODUCTION OF LIXSIYOZ COATINGS USING A SINGLE SOURCE FOR LI AND SI AND RESULTANT COATED PRODUCTS

AU - Noked, Malakhi

AU - Apeloig, Yitzhak

AU - Kratish, Yosi

AU - Bravo-Zhivotovskii, Dmitry

AU - Sharma, Rosy

PY - 2021/8/12

Y1 - 2021/8/12

N2 - Some exemplary embodiments of the invention relate to performing atomic layer deposition (ALD) or molecular layer deposition (MLD) of a volatile organo silyl lithium compound and ozone on a substrate. According to various exemplary embodiments of the invention the volatile organo silyl lithium compound includes SiLi2tBuMe and/or tBuMe2SiLi and/or tBuMe2SiNa and/or SiLi3Et and/or Alk3GeLi and/or [(Alk3Si)4AI]Li and/or (NMe2)(tBu)2SiLi and/or tBuMe2SiLi-TMEDA and/or SiLi + TMA2tBuMe. Resultant coated products and their uses are also disclosed.

AB - Some exemplary embodiments of the invention relate to performing atomic layer deposition (ALD) or molecular layer deposition (MLD) of a volatile organo silyl lithium compound and ozone on a substrate. According to various exemplary embodiments of the invention the volatile organo silyl lithium compound includes SiLi2tBuMe and/or tBuMe2SiLi and/or tBuMe2SiNa and/or SiLi3Et and/or Alk3GeLi and/or [(Alk3Si)4AI]Li and/or (NMe2)(tBu)2SiLi and/or tBuMe2SiLi-TMEDA and/or SiLi + TMA2tBuMe. Resultant coated products and their uses are also disclosed.

M3 - Patent

M1 - WO2021156867

ER -