Abstract
Defective lots due to an ion-implantation fab tool producing flash memories can be detected only six weeks after implantation, leading to material waste and financial loss. Machine learning (ML) is used to predict and explain tool failure. For training the ML model, a small and heavily imbalanced database is used with only 8% records of defective lots. It undermines knowledge representation and accurate prediction of defective lots. A methodology is presented that includes correlation analysis, discretization, down sampling, and model optimization using a performance measure, which is imbalance-insensitive. The methodology improves the accuracy of the ML models in classifying defective lots. The models also identify variables related to ion suppression and extraction voltages and currents and thereby may explain the failure.
Original language | American English |
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Title of host publication | 21st International Conference on Production Research |
Subtitle of host publication | Innovation in Product and Production, ICPR 2011 - Conference Proceedings |
Editors | Tobias Krause, Dieter Spath, Rolf Ilg |
ISBN (Electronic) | 9783839602935 |
State | Published - 1 Jan 2011 |
Event | 21st International Conference on Production Research: Innovation in Product and Production, ICPR 2011 - Stuttgart, Germany Duration: 31 Jul 2011 → 4 Aug 2011 |
Conference
Conference | 21st International Conference on Production Research: Innovation in Product and Production, ICPR 2011 |
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Country/Territory | Germany |
City | Stuttgart |
Period | 31/07/11 → 4/08/11 |
Keywords
- Bayesian networks
- Failure prediction
- Machine learning
- Neural networks
- Semiconductor manufacturing
All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Computer Science Applications
- Industrial and Manufacturing Engineering