Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate

Har'El Ilan; Sagi Frishman; Aharon J. Agranat

doi:https://doi.org/10.1063/1.4757128

Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate

Har'El Ilan, Sagi Frishman, Aharon J. Agranat

Department of Applied Physics

The Hebrew University of Jerusalem

Research output: Contribution to journal › Article › peer-review

Abstract

The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1 × 10 17 ions/cm ² within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by Hydrogen donors that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.

Original language	English
Article number	141111
Journal	Applied Physics Letters
Volume	101
Issue number	14
DOIs	https://doi.org/10.1063/1.4757128
State	Published - 1 Oct 2012

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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https://doi.org/10.1063/1.4757128

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title = "Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate",

abstract = "The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1 × 10 17 ions/cm 2 within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by Hydrogen donors that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.",

author = "Har'El Ilan and Sagi Frishman and Agranat, {Aharon J.}",

note = "Funding Information: We acknowledge the support of the Eshkol Fellowships Foundation, Grant No. 3-6435, of the Israeli Ministry of Science.",

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T1 - Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate

AU - Ilan, Har'El

AU - Frishman, Sagi

AU - Agranat, Aharon J.

N1 - Funding Information: We acknowledge the support of the Eshkol Fellowships Foundation, Grant No. 3-6435, of the Israeli Ministry of Science.

PY - 2012/10/1

Y1 - 2012/10/1

N2 - The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1 × 10 17 ions/cm 2 within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by Hydrogen donors that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.

AB - The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1 × 10 17 ions/cm 2 within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by Hydrogen donors that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.

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U2 - https://doi.org/10.1063/1.4757128

DO - https://doi.org/10.1063/1.4757128

M3 - مقالة

SN - 0003-6951

VL - 101

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 14

M1 - 141111

ER -

Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate

Abstract

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