Enhancement in the performance of ultrathin hematite photoanode for water splitting by an oxide underlayer

Takashi Hisatomi, Hen Dotan, Morgan Stefik, Kevin Sivula, Avner Rothschild, Michaël Grätzel, Nripan Mathews

Research output: Contribution to journalArticlepeer-review

Abstract

A 2-nm thick Nb 2O 5 underlayer deposited by atomic layer deposition increases the charge separation efficiency and the photovoltage of ultrathin hematite films by suppressing electron back injection. Absorbed photon-to-current efficiencies (APCE) as high as 40%, which are one of the highest ever reported with hematite photoanodes, are obtained at 400 nm at +1.43 V vs. RHE.

Original languageEnglish
Pages (from-to)2699-2702
Number of pages4
JournalAdvanced Materials
Volume24
Issue number20
DOIs
StatePublished - 22 May 2012

Keywords

  • electron back injection
  • hematite
  • niobium oxide
  • photoelectrochemical water splitting
  • underlayer

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Mechanical Engineering
  • General Materials Science

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