Abstract
We report the effect of extended duration electron beam exposure on the minority carrier transport properties of 10 MeV proton irradiated (fluence ∼1014 cm-2) Si-doped β-Ga2O3 Schottky rectifiers. The diffusion length (L) of minority carriers is found to decrease with temperature from 330 nm at 21 C to 289 nm at 120 C, with an activation energy of ∼26 meV. This energy corresponds to the presence of shallow Si trap-levels. Extended duration electron beam exposure enhances L from 330 nm to 726 nm at room temperature. The rate of increase for L is lower with increased temperature, with an activation energy of 43 meV. Finally, a brief comparison of the effect of electron injection on proton irradiated, alpha-particle irradiated and a reference Si-doped β-Ga2O3 Schottky rectifiers is presented.
| Original language | English |
|---|---|
| Article number | 045018 |
| Number of pages | 4 |
| Journal | ECS Journal of Solid State Science and Technology |
| Volume | 9 |
| Issue number | 4 |
| DOIs | |
| State | Published - 5 Jan 2020 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials