Effect of Annealing on Electronic Carrier Transport Properties of Gamma-Irradiated AlGaN/GaN High Electron Mobility Transistors

A. Yadav, C. Schwarz, M. Shatkhin, L. Wang, E. Flitsiyan, L. Chernyak, L. Lu, Y. H. Hwang, F. Ren, S. J. Pearton, I. Lubomirsky

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

AlGaN/GaN High Electron Mobility Transistors were irradiated with Co-60 gamma-ray doses from 100 Gy up to a maximum dose of 1000 Gy. After irradiation, the devices were annealed at 200 degrees C for 25 minutes. Annealing of the gamma irradiated transistors show that partial recovery of device performance is possible at this temperature. The impact of irradiation and annealing on minority carrier diffusion length and activation energy were monitored through the use of the Electron Beam Induced Current method. Impact on transfer, gate, and drain characteristics were analyzed through current-voltage measurements.

Original languageEnglish
Title of host publicationWIDE BANDGAP SEMICONDUCTOR MATERIALS AND DEVICES 15
EditorsF Ren, YL Wang, S Jang, SJ Pearton, EB Stokes, J Kim
PublisherThe Electrochemical Society
Pages171-177
Number of pages7
DOIs
StatePublished - 2014
EventSymposium on Wide Bandgap Semiconductor Materials and Devices 15 Held during the 225th Meeting of the Electrochemical-Society - Orlando
Duration: 11 May 201415 May 2014

Publication series

NameECS Transactions
Number4
Volume61
ISSN (Print)1938-5862

Conference

ConferenceSymposium on Wide Bandgap Semiconductor Materials and Devices 15 Held during the 225th Meeting of the Electrochemical-Society
CityOrlando
Period11/05/1415/05/14

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