Abstract
Exploiting the full potential of metal and semiconductor nanoparticles for advanced nanotechnological applications requires their organization into predefined structures with high orientational control. Nanofabrication approaches that combine high resolution lithography and self-assembly afford the advantages of accurate placement, compositional diversity, and reduced production costs. This review concentrates on the creation of organized nanoparticle superstructures assisted by recent developments in the directed self-assembly of block copolymers, and delineates possible applications.
| Original language | English |
|---|---|
| Pages (from-to) | 613-622 |
| Number of pages | 10 |
| Journal | Polymers for Advanced Technologies |
| Volume | 28 |
| Issue number | 5 |
| DOIs | |
| State | Published - May 2017 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 9 Industry, Innovation, and Infrastructure
Keywords
- block copolymers
- directed self-assembly
- lithography
- nanoparticles
All Science Journal Classification (ASJC) codes
- Polymers and Plastics
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