Chemical epitaxy of CdS on GaAs

Ofir Friedman, Alexander Upcher, Tzvi Templeman, Vladimir Ezersky, Yuval Golan

Research output: Contribution to journalArticlepeer-review


We have studied the microstructure and crystallographic orientation of CdS films chemically deposited on GaAs substrates. CdS thin films deposited on GaAs(100) showed an oriented polycrystalline micro-structure. Depending on the duration and the temperature of the deposition, two out-of-plane orientations were obtained, with the (10.1) and (00.1) planes of the wurtzite CdS film aligned parallel to the GaAs substrate surface. While the orientation of CdS thin films on GaAs(100) substrate is highly sensitive to the deposition parameters, they do not affect the orientation obtained on GaAs(111)B substrates, which resulted exclusively in monocrystalline (00.1) oriented CdS films. In all three orientations above, a high density of stacking-faults was observed in the films. On the other hand, growth on GaAs(111)A substrate resulted in randomly oriented polycrystalline films. This work provides the first reported evidence for chemical epitaxy of CdS on GaAs.

Original languageAmerican English
Pages (from-to)1660-1667
Number of pages8
JournalJournal of Materials Chemistry C
Issue number7
StatePublished - 1 Jan 2017

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Materials Chemistry


Dive into the research topics of 'Chemical epitaxy of CdS on GaAs'. Together they form a unique fingerprint.

Cite this