A novel dynamic process control scheme to improve cycle time in Fabs

Research output: Contribution to journalArticlepeer-review

Abstract

Based on previous results showing the tradeoff existing between cycle time (CT) and yield in fabs we propose to dynamically set the control limits of the statistical process control. The limits are determined based on the current level of congestion. We study both a single station and a simple multiple station transfer line and show that the resulting operating points are vastly better in terms of CT, while keeping the yield loss at acceptable levels.

Original languageEnglish
Article number7592402
Pages (from-to)32-38
Number of pages7
JournalIEEE Transactions on Semiconductor Manufacturing
Volume30
Issue number1
DOIs
StatePublished - 1 Feb 2017

Keywords

  • Semiconductor manufacturing
  • metrology
  • statistical process control

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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