A new approach to modelling Kelvin probe force microscopy of hetero-structures in the dark and under illumination

Yong Huang; Alexandre Gheno; Alain Rolland; Laurent Pedesseau; Sylvain Vedraine; Olivier Durand; Johann Bouclé; James P. Connolly; Lioz Etgar; Jacky Even

doi:10.1007/s11082-017-1305-z

A new approach to modelling Kelvin probe force microscopy of hetero-structures in the dark and under illumination

Yong Huang, Alexandre Gheno, Alain Rolland, Laurent Pedesseau, Sylvain Vedraine, Olivier Durand, Johann Bouclé, James P. Connolly, Lioz Etgar, Jacky Even

Institute of Chemistry

The Hebrew University of Jerusalem

Research output: Contribution to journal › Article › peer-review

Abstract

A numerical method is proposed to model Kelvin probe force microscopy of hetero-structures in the dark and under illumination. It is applied to FTO/TiO₂ and FTO/TiO₂/MAPbI₃ structures. The presence of surface states on the top of the TiO₂ layers are revealed by combining theoretical computation and experimental results. Basic features of Kelvin probe force microscopy under illumination, namely surface photovoltage, are simulated as well. The method paves the way toward further investigations of more complicated optoelectronic devices.

Original language	English
Article number	41
Journal	Optical and Quantum Electronics
Volume	50
Issue number	1
DOIs	https://doi.org/10.1007/s11082-017-1305-z
State	Published - 1 Jan 2018

Keywords

Drift–diffusion
Halide perovskite
Hetero-structures
KPFM
SPV

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

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10.1007/s11082-017-1305-z

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title = "A new approach to modelling Kelvin probe force microscopy of hetero-structures in the dark and under illumination",

abstract = "A numerical method is proposed to model Kelvin probe force microscopy of hetero-structures in the dark and under illumination. It is applied to FTO/TiO2 and FTO/TiO2/MAPbI3 structures. The presence of surface states on the top of the TiO2 layers are revealed by combining theoretical computation and experimental results. Basic features of Kelvin probe force microscopy under illumination, namely surface photovoltage, are simulated as well. The method paves the way toward further investigations of more complicated optoelectronic devices.",

keywords = "Drift–diffusion, Halide perovskite, Hetero-structures, KPFM, SPV",

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AU - Huang, Yong

AU - Gheno, Alexandre

AU - Rolland, Alain

AU - Pedesseau, Laurent

AU - Vedraine, Sylvain

AU - Durand, Olivier

AU - Bouclé, Johann

AU - Connolly, James P.

AU - Etgar, Lioz

AU - Even, Jacky

PY - 2018/1/1

Y1 - 2018/1/1

N2 - A numerical method is proposed to model Kelvin probe force microscopy of hetero-structures in the dark and under illumination. It is applied to FTO/TiO2 and FTO/TiO2/MAPbI3 structures. The presence of surface states on the top of the TiO2 layers are revealed by combining theoretical computation and experimental results. Basic features of Kelvin probe force microscopy under illumination, namely surface photovoltage, are simulated as well. The method paves the way toward further investigations of more complicated optoelectronic devices.

AB - A numerical method is proposed to model Kelvin probe force microscopy of hetero-structures in the dark and under illumination. It is applied to FTO/TiO2 and FTO/TiO2/MAPbI3 structures. The presence of surface states on the top of the TiO2 layers are revealed by combining theoretical computation and experimental results. Basic features of Kelvin probe force microscopy under illumination, namely surface photovoltage, are simulated as well. The method paves the way toward further investigations of more complicated optoelectronic devices.

KW - Drift–diffusion

KW - Halide perovskite

KW - Hetero-structures

KW - KPFM

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M3 - مقالة

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VL - 50

JO - Optical and Quantum Electronics

JF - Optical and Quantum Electronics

IS - 1

M1 - 41

ER -

A new approach to modelling Kelvin probe force microscopy of hetero-structures in the dark and under illumination

Abstract

Keywords

All Science Journal Classification (ASJC) codes

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