3D whispering-gallery-mode microlasers by direct laser writing and subsequent soft nanoimprint lithography

Philipp Brenner; Ofer Bar-On; Tobias Siegle; Tobias Leonhard; Raz Gvishi; Carsten Eschenbaum; Heinz Kalt; Jacob Scheuer; Uli Lemmer

doi:https://doi.org/10.1364/AO.56.003703

3D whispering-gallery-mode microlasers by direct laser writing and subsequent soft nanoimprint lithography

Philipp Brenner, Ofer Bar-On, Tobias Siegle, Tobias Leonhard, Raz Gvishi, Carsten Eschenbaum, Heinz Kalt, Jacob Scheuer, Uli Lemmer

School of Electrical Engineering

Tel Aviv University

Research output: Contribution to journal › Article › peer-review

Abstract

We demonstrate the realization of 3D whispering-gallery-mode (WGM) microlasers by direct laser writing (DLW) and their replication by nanoimprint lithography using a soft mold technique ("soft NIL"). The combination of DLW as a method for rapid prototyping and soft NIL offers a fast track towards large scale fabrication of 3D passive and active optical components applicable to a wide variety of materials. A performance analysis shows that surface-scattering-limited Q-factors of replicated resonators as high as 1 × 10⁵ at 635 nm can be achieved with this process combination. Lasing in the replicated WGM resonators is demonstrated by the incorporation of laser dyes in the target material. Low lasing thresholds in the order of 15 kW/cm² are obtained under ns-pulsed excitation.

Original language	English
Pages (from-to)	3703-3742
Number of pages	40
Journal	APPLIED OPTICS
Volume	56
Issue number	13
DOIs	https://doi.org/10.1364/AO.56.003703
State	Published - 1 May 2017

All Science Journal Classification (ASJC) codes

Engineering (miscellaneous)
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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https://doi.org/10.1364/AO.56.003703

Cite this

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title = "3D whispering-gallery-mode microlasers by direct laser writing and subsequent soft nanoimprint lithography",

abstract = "We demonstrate the realization of 3D whispering-gallery-mode (WGM) microlasers by direct laser writing (DLW) and their replication by nanoimprint lithography using a soft mold technique ({"}soft NIL{"}). The combination of DLW as a method for rapid prototyping and soft NIL offers a fast track towards large scale fabrication of 3D passive and active optical components applicable to a wide variety of materials. A performance analysis shows that surface-scattering-limited Q-factors of replicated resonators as high as 1 × 105 at 635 nm can be achieved with this process combination. Lasing in the replicated WGM resonators is demonstrated by the incorporation of laser dyes in the target material. Low lasing thresholds in the order of 15 kW/cm2 are obtained under ns-pulsed excitation.",

author = "Philipp Brenner and Ofer Bar-On and Tobias Siegle and Tobias Leonhard and Raz Gvishi and Carsten Eschenbaum and Heinz Kalt and Jacob Scheuer and Uli Lemmer",

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AU - Brenner, Philipp

AU - Bar-On, Ofer

AU - Siegle, Tobias

AU - Leonhard, Tobias

AU - Gvishi, Raz

AU - Eschenbaum, Carsten

AU - Kalt, Heinz

AU - Scheuer, Jacob

AU - Lemmer, Uli

PY - 2017/5/1

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N2 - We demonstrate the realization of 3D whispering-gallery-mode (WGM) microlasers by direct laser writing (DLW) and their replication by nanoimprint lithography using a soft mold technique ("soft NIL"). The combination of DLW as a method for rapid prototyping and soft NIL offers a fast track towards large scale fabrication of 3D passive and active optical components applicable to a wide variety of materials. A performance analysis shows that surface-scattering-limited Q-factors of replicated resonators as high as 1 × 105 at 635 nm can be achieved with this process combination. Lasing in the replicated WGM resonators is demonstrated by the incorporation of laser dyes in the target material. Low lasing thresholds in the order of 15 kW/cm2 are obtained under ns-pulsed excitation.

AB - We demonstrate the realization of 3D whispering-gallery-mode (WGM) microlasers by direct laser writing (DLW) and their replication by nanoimprint lithography using a soft mold technique ("soft NIL"). The combination of DLW as a method for rapid prototyping and soft NIL offers a fast track towards large scale fabrication of 3D passive and active optical components applicable to a wide variety of materials. A performance analysis shows that surface-scattering-limited Q-factors of replicated resonators as high as 1 × 105 at 635 nm can be achieved with this process combination. Lasing in the replicated WGM resonators is demonstrated by the incorporation of laser dyes in the target material. Low lasing thresholds in the order of 15 kW/cm2 are obtained under ns-pulsed excitation.

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JO - APPLIED OPTICS

JF - APPLIED OPTICS

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3D whispering-gallery-mode microlasers by direct laser writing and subsequent soft nanoimprint lithography

Abstract

All Science Journal Classification (ASJC) codes

UN SDGs

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